MASSACHUSETTS INSTITUTE OF TECHNOLOGY (MIT) GRANTED PATENT FOR ALKALI METAL ION SOURCE WITH MODERATE RATE OF ION RELEASE AND METHODS OF FORMING.

Massachusetts Institute of Technology is an establishment that renders educational services. The Institute compromises degree courses in architecture and planning, engineering, humanities, arts, social sciences, management, and science. MIT trains students in the State of Massachusetts and its School of Engineering gives students various alternatives in the engineering field, seeking a degree.

In India, the chemical business of Massachusetts Institute of Technology focuses on systems, methods, and compositions for targeted nucleic acid editing, microbial engineering for the production of chemical and pharmaceutical products from the isoprenoid pathway, novel crispr enzymes, and systems, and waveguide formation using CMOS fabrication techniques.

Massachusetts Institute of Technology filed a patent application numbered 10293/DELNP/2015 that is titled as ALKALI METAL ION SOURCE WITH MODERATE RATE OF ION RELEASE AND METHODS OF FORMING. The patent has been filed in the field of Chemicals. This Patent Application has been granted as Patent Number 346465. This invention covers a method of forming an alkali metal ion source through multiple steps. In it a particular alkali metal ion-bearing framework silicate is combined with another component that contains oxide and hydroxide of an alkaline earth metal and an alkali metal, to form a solid mixture. This solid mixture is exposed to a hydrothermal treatment to form a gel that comprises the silicon and the alkali of the first component, giving rise to the source of the alkali metal ion.

During the patent examination, the patent examiner raised objections under Section 3(d) of the Patents (Amendment) Act, 2005 stating that the subject matter of claims is a mere use of a known process in respect of the process disclosed by citations unless such known process results in a new product or employs at least one new reactant.

As a response, the Applicant submitted that the claimed process comprises novel and inventive steps for forming an alkali metal ion source. Hence, the objection of 3(d) does not apply.

Advocate Rahul Dev is a Patent Attorney & International Business Lawyer practicing Technology, Intellectual Property & Corporate Laws. He is reachable at rd (at) patentbusinesslawyer (dot) com & @rdpatentlawyer on Twitter.

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